P474 – HV sputter deposition system ESRF
Application
HV inline sputter deposition system for thin film and multilayer deposition at special sized substrates for X-Ray mirror production
Year of delivery
2021
Installation site
ESRF, Grenoble, France
Design Features
- Inline HV magnetron sputter deposition system with full automatic control system for x-ray mirror production with very high film uniformity below 1%.
- Four 3″ magnetrons in face to face configuration.
- Two magnetrons mounted at a differentially pumped fliping door for fast and easy target exchange and source cleaning.
- Direct gas inlet close to the target installed at each magnetron.
- Low pressure and low power sputtering possible.
- In situ adjustable target to substrate distance by manual motion of the source.
- Stepper motor driven source shutter.
- Motorized sample trolley with speed profile motion mode as well as constant speed motion mode implemented.
- Maximal sample size of 300mm x 80mm x 80 mm.
- Integrated bake out system.
- Load lock chamber with manual sample transfer system and sliding access door and lamp heating option.
Special Features
- Large motion speed range from about 1 mm/s up to 200mm/s possible.
Outer Dimensions
Technical specifications and performance values
General
Sputtering chamber
Size
Cubic shape chamber, about 2320 mm length, about 435 mm width & about 700 mm height
Material
stainless steel
Load lock chamber
Size
Cubic shape chamber, about 820 mm length, about 360 mm width & about 370 mm height
Material
stainless steel
Vacuum
Sputtering chamber
Base pressure
< 2 * 10-8 mbar
Pump down time
0,5 hours to < 10-7 mbar
Chamber pumping
Turbo pumping stage, several chamber doors differentially pumped by dry foreline pump
Bake out
< 150°C
Load lock chamber
Base pressure
< 5 * 10-8 mbar
Pump down time
3,5 hours to < 3 * 10-7 mbar
Chamber pumping
Turbo pumping stage, chamber door differentially pumped by dry foreline pump
Manipulator features
Sputtering chamber
Sample size
max. 300mm x 80mm x 80 mm special shaped samples
Motion axes
Motorized sample translation axis with motion speed range of min. 1 mm/s up to max. 100 mm/s, incl. speed profile feature
Sample preparation features
Load lock chamber
Thermal treatment
max. 200°C at sample (with temperature regulation)
Performance test results
Chamber pump down
Long time sample heating (in Load lock chamber)
Sputter source stability
Speed profile repeatability
