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P481 – 6″ HV sputter deposition HZDR

Application

HV sputter deposition system for thin film and multilayer deposition at 6″ substrates

Year of delivery

2021

Installation site

HZDR, Dresden-Rossendorf, Germany

Design Features

  • HV magnetron sputter deposition system in face to face sputter down configuration.
  • Up to three 8″ magnetrons in face to face configuration with possibility of low pressure and low power sputtering.
  • Motorized sample manipulator with three motion axes (z translation, manipulator arm rotation & sample planetary rotation).
  • Integrated bake out system.
  • Load lock chamber with storage.

Special Features

  • Different sample sizes from 6″ wafer down to 100mm x 100mm samples can be handled (using different kind of sample adapters).

Outer Dimensions

Technical specifications and performance values

General

Sputtering chamber

Size

1000 mm diameter, about 650 mm height

Material

stainless steel

Load lock chamber

Size

350 mm diameter, about 1050 mm height

Material

stainless steel

Vacuum

Sputtering chamber

Base pressure

< 2 *10-8 mbar

Pump down time

3 hours to < 9 * 10-8 mbar

Chamber pumping

Turbo pumping stage, chamber lid differentially pumped by dry foreline pump

Bake out

< 120°C

Load lock chamber

Base pressure

< 9 * 10-8 mbar

Pump down time

3 hours to < 9 * 10-8 mbar (without samples installed)
16 hours to < 9 * 10-8 mbar (with 20 samples installed)

Chamber pumping

Turbo pumping stage with dry foreline pump

Manipulator features

Sputtering chamber

Sample size

diameter max. 6″ substrate

Motion axes

3 motorized axes (manipulator z tranlsation, (continous) manipulator arm rotation and (continous, planetary) sample stage rotation)

Special features

Motorized source shutter (open / close synchronised with sample rotation)

Load lock chamber

(Sample storage)

Storage size

20 sample holders

Sample size

diameter max. 6″ substrate

Motion axes

motorized z tranlsation and motorized transfer rod

Performance test results

Chamber pump down
Deposition uniformity (face to face, ferromagnetic)
Giant magnetoresistance (GMR) effect
Deposition uniformity (face to face, non ferromagn.)