P476 – 1″ HV Ion beam sputter deposition system MLU
Application
HV ion beam sputter deposition system for thin film and multilayer deposition at 1″ substrates
Year of delivery
2020
Installation site
MLU, Halle (Saale), Germany
Design Features
- HV ion beam sputter deposition system.
- One focused gridded DC ion source oriented towards a target manipulator with four 2″ targets.
- Fully motorized 3 axes target manipulator (manipulator z translation, manipulator rotation & (continous) target rotation).
- Fully motorized 2 axes sample manipulator with intergated shutter & mask positioning and maximal sample temperature well above 800°C.
- Big front door for sample exchange and service tasks.
- Side port with door for glove box integration.
Special Features
- Up to 3 masks can be mouted to the sample stage at the same time to be exchanged automatically during a deposition process.
Outer Dimensions
Technical specifications and performance values
General
Sputtering chamber
Size
320 mm diameter, about 430 mm height
Material
stainless steel
Vacuum
Sputtering chamber
Base pressure
< 10-7 mbar
Pump down time
4 hours to < 5 * 10-7 mbar
Chamber pumping
Turbo pumping stage with dry foreline pump
Manipulator features
Sputtering chamber
Sample size
diameter max. 1″ substrate
Motion axes
2 motorized axes (manipulator z translation and mask (exchange) translation)
Temperatures
Room temperature (not stabilized) up to 800°C at sample
Performance test results
Chamber pump down
Long time sample heating
