Ion beam etching systems
Ion beam etching systems are mainly used for structuring sample surfaces by moving the sample below a fine spot ion beam. Bestec develop complete systems including the complex sample motion stage.
Typical design parameters
- Depending on user requests either fine spot ion gun, focused gridded ICP RF ion gun or focused gridded DC ion gun.
- Multi axes sample stage.
- Software control incl. automatic sample motion during the etching process.
Options
- Integration of source shutter or sample shutter.
- Integration of mask system to define the ion beam spot size at the sample.
- Integration of sample heating or sample cooling.
